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Fabrication of high aspect ratio Si nanogratings with smooth sidewalls for a deep UV-blocking partic
  • 所属机构名称：中国科学院光电技术研究所
  • 会议名称：51st International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
  • 成果类型：会议
  • 会场：Denver, CO
  • 相关项目：微电子学
作者： Mukherjee, Pran|Guo, L. Jay|Kang, Myung-Gyu|Herrero, Fred A.|Zurbuchen, Thomas H.|
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微电子学
期刊论文 5 会议论文 5
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