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Research on Dielectric Recovery Characteristic and Band Width Phenomena in High Voltage SF6 Circuit
  • 所属机构名称：大连理工大学
  • 会议名称：World Automation Congress 2008
  • 成果类型：会议
  • 会场：Waikoloa, HI
  • 相关项目：金属蒸气电弧等离子体调控理论及在高压断路器领域中的应用
作者： Hou, Chunguan|Cao, Yundong|Liu, Xiaoming|Li, Jing|
同会议论文项目
金属蒸气电弧等离子体调控理论及在高压断路器领域中的应用
期刊论文 66 会议论文 55 专利 13 著作 2
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