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Research on Feature Extraction for Chip Resistors defect based on PCA
  • 所属机构名称：苏州大学
  • 会议名称：International Workshop on Image Processing and Optical Engineering (IPOE)/International Conference
  • 时间：2012.2.26
  • 成果类型：会议
  • 相关项目：基于介质阻挡放电的高效低温阳极键合机理及方法研究
作者： Pan, M. Q.|Chen, L. G.|Chen, T.|Zhao, M. X.|Wang, Z. H.|
同会议论文项目
基于介质阻挡放电的高效低温阳极键合机理及方法研究
期刊论文 7 会议论文 5
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Research on feature extraction for chip resistors defect based on PCA
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