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Thermalmechanical behavior of TSVs with WN/Ni as barrier/seed layer system for 2.5Dintegration
  • 所属机构名称：中国科学院微电子研究所
  • 会议名称：2015 International Conference on Solid State Devices and Materials,
  • 时间：2015.9.27
  • 成果类型：会议
  • 相关项目：面向高密度三维集成的玻璃等离子体深刻蚀技术研究
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面向高密度三维集成的玻璃等离子体深刻蚀技术研究
期刊论文 2 会议论文 8
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