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Impact of molybdenum/silicon multilayer structure on extreme ultraviolet mask fabrication - art. no.
  • 所属机构名称：北京理工大学
  • 会议名称：3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies
  • 成果类型：会议
  • 会场：Chengdu, PEOPLES R CHINA
  • 相关项目：高数值孔径（NA>1）浸没光刻成像中偏振效应研究
作者： Zhao, Guorong|Li, Yanqiu|
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高数值孔径（NA>1）浸没光刻成像中偏振效应研究
期刊论文 17 会议论文 12
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