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Optimization of HfO2 growth process by atomic layer deposition (ALD) for high performance charge tra
  • 所属机构名称：中国科学院微电子研究所
  • 会议名称：China Semiconductor Technology International Conference 2013, CSTIC 2013
  • 时间：2013
  • 成果类型：会议
  • 相关项目：新型微电子器件集成的基础研究
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新型微电子器件集成的基础研究
期刊论文 98 会议论文 12
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