位置：成果数据库 > 会议 > 会议详情页
Design of compliant parallel mechanism for nanoimprint lithography
  • 所属机构名称：北京航空航天大学
  • 会议名称：2011 6th IEEE Conference on Industrial Electronics and Applications (ICIEA 2011)
  • 时间：2011.6.6
  • 成果类型：会议
  • 相关项目：具有压印力解耦功能的新型纳米压印平行对准系统关键技术研究
作者： Xiantao Sun|Weihai Chen|Rui Zhou|Jianbin Zhang|Wenjie Chen|
同会议论文项目
具有压印力解耦功能的新型纳米压印平行对准系统关键技术研究
期刊论文 9 会议论文 16
同项目会议论文
Design and modeling of a large-displacement flexure-based parallel micro-positioning stage
Design of a novel rotary micropositioning stage with remote center of motion characteristic
Development of a force-decoupled compound parallel alignment stage for high-resolution imprint litho
A cost effective multi- axis force sensor for large scale measurement: design, modeling and simulati
Development of a flexure-based XY positioning stage for micro/nano manipulation
Design and Analysis of a New Flexure-based XY Micropositioning Stage with Decoupled Motion Character
Design, modeling , and simulation of a 2-DOF microgripper for grasping and rotating of optical fiber
A MEMS Based Sensor for Large Scale Force Measurement
A Flexure-based 3-DOF Parallel Mechanism for Optical Fiber Assembly
A novel positioning stage with resolution enhancement functionality for nano manipulation
A Kalman filter approach based on random drift data of Fiber Optic Gyro
Development of control module in small-size modular actuator for robotics
Error Analysis and Flexibility Compensation of a Cable-Driven Humanoid-Arm Manipulator
Vehicle Following Algorithm Realization Based on a Virtual Flexible Curved Bar with Force Delay
Design of an Aerostatic Imprint Head with Off-plane Alignment Functionality for Nanoimprint Lithogra