位置：成果数据库 > 会议 > 会议详情页
COE based on redundancy material defect
  • 所属机构名称：西安电子科技大学
  • 会议名称：3rd international Conference on Manufacturing Science and Engineering, ICMSE 2012，EI: 20121214875224
  • 时间：2012.3.24
  • 成果类型：会议
  • 相关项目：基于随机缺陷的版图布线优化算法研究
作者： Pang| Ruoyu| Fang| J|
同会议论文项目
基于随机缺陷的版图布线优化算法研究
期刊论文 24 会议论文 16
同项目会议论文
A Study on CIF-to-BMP Format Transformation Algorithm
Range Selection of Critical Area Optimization
A Study on Optimized Layout Transformation Algorithm
Open Critical Area-Constrained Redundant Via Insertion
Optimized Layout Transformation Based on Chain Code and Harris Corner Detection
A new extraction Algorithm of Image layout Based on Sliding Window
一种有效的图像匹配方法
Critical Area-Constrained Redundant Via Insertion
Dilation of Net Skeleton for Application Study on Layout Optimization
An Algorithm for Stitching Images with Different Contrast and Elimination of Ghost
A New Graph Morphological Enhancement Operator for Low Illumination Color Image
A Novel Algorithm of IC Defect Images Enhancement Based on Histogram Equalization and IHS Transform
Critical area-constrained redundant via insertion
IC defect image filtering based on graph morphology
A New Threshold-constrained IFT Algorithm for Segmenting IC Defects