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3-D Edge-Element Analysis of Characteristic Parameters for II-VI Semiconductor Materia
  • 所属机构名称：中国科学技术大学
  • 会议名称：Proceedings of ICCEA’99, Beijing, 1999
  • 作者或编辑：3448
  • 语言：英文
  • 成果类型：会议
  • 相关项目：半导体霍耳效应测量的无接触微波方法
作者： and Sheng Xinqing|Jia Dongyan Xu Shanjia|
同会议论文项目
半导体霍耳效应测量的无接触微波方法
期刊论文 5 会议论文 33
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