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Characteristics Sensitivity of FinFET to Fin Vertical Nonuniformity
  • 所属机构名称：北京大学
  • 会议名称：NSTI-Nanotech 2011
  • 时间：2011
  • 成果类型：会议
  • 相关项目：纳米FinFET器件的退化模型和失效机理研究
作者： Xu, Jiaojiao|Ma, Chenyue|Zhang, Chenfei|Zhang, Xiufang|Wu, Wen|Cao, Yu|Lin, Xinnan|He, Jin|
同会议论文项目
纳米FinFET器件的退化模型和失效机理研究
期刊论文 4 会议论文 9 专利 2
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