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Optimized HfO2 Atomic layer depositiion process for high performane Charge Trapping flash memory app
  • 所属机构名称：中国科学院微电子研究所
  • 会议名称：2013 China Semiconductor Technology International Conference
  • 时间：2013.3.18
  • 成果类型：会议
  • 相关项目：面向三维集成的纳米尺度电荷陷阱存储器机理与可靠性研究
作者： Shenjie Zhao|Ziyu Liu|Yulong Han|Ming Liu|
同会议论文项目
面向三维集成的纳米尺度电荷陷阱存储器机理与可靠性研究
期刊论文 24 会议论文 15
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