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Study on the key parameters in etching of fused silica using atmospheric inductively coupled plasma
  • 所属机构名称：哈尔滨工业大学
  • 会议名称：5th International Conference on Asian Society for Precision Engineering and Nanotechnology, ASPEN 20
  • 时间：2015
  • 成果类型：会议
  • 相关项目：自由曲面光学零件的大气等离子体射流加工技术基础研究
同会议论文项目
自由曲面光学零件的大气等离子体射流加工技术基础研究
期刊论文 18 会议论文 6 专利 26
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Form Control in Atmospheric Pressure Plasma Processing of Ground Fused Silica
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