欢迎您!
东篱公司
退出
申报数据库
申报指南
立项数据库
成果数据库
期刊论文
会议论文
著 作
专 利
项目获奖数据库
位置:
成果数据库
>
会议
> 会议详情页
A Study on Optimized Layout Transformation Algorithm
所属机构名称:西安电子科技大学
会议名称:IEEE ASID 2013
时间:2013.10.25
成果类型:会议
相关项目:基于随机缺陷的版图布线优化算法研究
同会议论文项目
基于随机缺陷的版图布线优化算法研究
期刊论文 24
会议论文 16
同项目会议论文
A Study on CIF-to-BMP Format Transformation Algorithm
Range Selection of Critical Area Optimization
Open Critical Area-Constrained Redundant Via Insertion
Optimized Layout Transformation Based on Chain Code and Harris Corner Detection
A new extraction Algorithm of Image layout Based on Sliding Window
COE based on redundancy material defect
一种有效的图像匹配方法
Critical Area-Constrained Redundant Via Insertion
Dilation of Net Skeleton for Application Study on Layout Optimization
An Algorithm for Stitching Images with Different Contrast and Elimination of Ghost
A New Graph Morphological Enhancement Operator for Low Illumination Color Image
A Novel Algorithm of IC Defect Images Enhancement Based on Histogram Equalization and IHS Transform
Critical area-constrained redundant via insertion
IC defect image filtering based on graph morphology
A New Threshold-constrained IFT Algorithm for Segmenting IC Defects