位置：成果数据库 > 会议 > 会议详情页
Polarization aberration influence on image in lithography system at hyper NA
  • 所属机构名称：北京理工大学
  • 会议名称：7th International Conference on Optics-photonics Design & Fabrication
  • 时间：2010.4.4
  • 成果类型：会议
  • 相关项目：超大数值孔径光刻成像与图形保真技术研究
作者： Li, Yanqiu|Guo, Xuejia|Liu, xiaolin|
同会议论文项目
超大数值孔径光刻成像与图形保真技术研究
期刊论文 70 会议论文 20 专利 75
同项目会议论文
Detailed illuminator design for full field ArF lithography system with a method based on the fly'
High numerical aperture Hartmann wavefront sensor with pinhole array extended source
Improved wavefront reconstruction using difference Zernike polynomials for two double-shearing wavef
Influence of Flare and NA Error on Lithography
Source mask optimization using real-coded genetic algorithms
Comparison of wavefront reconstruction with modal method and zonal method for the inspection of cata
Simulation of Sub-wavelength 3D Photomask Induced Polarization Effect by RCWA
A technique for extracting and analyzing the polarization aberration of hyper-numerical aperture ima
In-situ aberration measurement technique based on aerial image with optimized source
In situ aberration measurement technique based on quadratic Zernike model
Three-dimensional polarization aberration in hyper-numerical aperture lithography optics
The Cross Talk of Multi-errors Impact on Lithography Performance and the Method of Its Control
Impact of MSD and Mask Manufacture Errors on 45nm-node Lithography
Illuminator design for small field ArF lithography system
Symmetric polarization aberration compensation method based on scalar aberration control for lithogr
Two-dimensional Interferogram Extrapolation Method Using Linear Carrier-frequency
Gradient-based Resolution Enhancement Optimization Methods based on Vector Imaging Model
Robust Resolution Enhancement Optimization Methods to Process Variations based on Vector Imaging Mod
Impact of non-uniform polarized illumination on hyper-NA lithography