位置：成果数据库 > 会议 > 会议详情页
Resolution enhancement technology for ArF dry lithography at 65 nm node - art. no. 67240Z
  • 所属机构名称：北京理工大学
  • 会议名称：3rd International Symposium on Advanced Optical Manufacturing and Testing Technologies
  • 成果类型：会议
  • 会场：Chengdu, PEOPLES R CHINA
  • 相关项目：高数值孔径（NA>1）浸没光刻成像中偏振效应研究
作者： Gao, Songbo|Li, Yanqiu|
同会议论文项目
高数值孔径（NA>1）浸没光刻成像中偏振效应研究
期刊论文 17 会议论文 12
同项目会议论文
The application of partial differential equation in interferogram denoising - art. no. 662325
A comparison study of tantalum-nitrogen and chromium absorber in extreme ultraviolet mask fabricatio
Option of resolution enhancement technology in advanced lithography - art. no. 67240G
Potential of phase-shifted optical proximity correction for 65 nm T-shaped pattern in high numerical
Impact of molybdenum/silicon multilayer structure on extreme ultraviolet mask fabrication - art. no.
Computer aided alignment of a 20Х Schwarzschild projection optics
Impact of source polarization on the imaging of line and space features at 45nm half pitch node - ar
Interferogram region extrapolation technology by exemplar-based image inpainting - art. no. 67234R
Influence of polarization on the optimization of dual BARC structures for hyper-numerical aperture A
Design optimization of phase-shifting point diffraction interferometer
Development of a 20Х Schwarzschild projection optics for principle experiment of EUV at-wavelength i