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A comparison study of tantalum-nitrogen and chromium absorber in extreme ultraviolet mask fabricatio
  • 所属机构名称：北京理工大学
  • 会议名称：Conference on Photomask and Next-Generation Lithography Mask Technology XIV
  • 成果类型：会议
  • 会场：Yokohama JAPAN
  • 相关项目：高数值孔径（NA>1）浸没光刻成像中偏振效应研究
作者： Yanqiu Li|Guorong Zhao|
同会议论文项目
高数值孔径（NA>1）浸没光刻成像中偏振效应研究
期刊论文 17 会议论文 12
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