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Source mask optimization using real-coded genetic algorithms
  • 所属机构名称：北京理工大学
  • 会议名称：Conference on Optical Microlithography XXVI
  • 时间：2013
  • 成果类型：会议
  • 相关项目：超大数值孔径光刻成像与图形保真技术研究
作者： Yang, Chaoxing|Wang, Xiangzhao|Li, Sikun|Erdmann, Andreas|
同会议论文项目
超大数值孔径光刻成像与图形保真技术研究
期刊论文 70 会议论文 20 专利 75
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