欢迎您!
东篱公司
退出
申报数据库
申报指南
立项数据库
成果数据库
期刊论文
会议论文
著 作
专 利
项目获奖数据库
位置:
成果数据库
>
会议
> 会议详情页
Thermoelectric Behavior of Microchannel Plates Fabricated by Photo-assisted Electrochemical Etching
所属机构名称:华东师范大学
会议名称:IEEE MEMS2010
成果类型:会议
相关项目:光子晶体材料应用于红外辐射阻断和隔热的探索
作者:
王连卫|
同会议论文项目
光子晶体材料应用于红外辐射阻断和隔热的探索
期刊论文 14
会议论文 10
专利 10
同项目会议论文
Investigation of Inner Surface of Silicon Microchannels Fabricated by Electrochemical Method
Preparation of Ni Current Collector and MoS2 Cathode in Three-Dimensional Li Ion Microbattery Based
The Improvement of Electrochemical Etching Process for Silicon Microchannel Plates
Fabrication and characterization of 3D pn junction structure for radiation detection
Fabrication of a reflective mirror within wide incidence angles for mid-infrared wavelength
Investigation of the Formation of undercut during the Fabrication of Silicon Microchannels by Electr
Oxidation of High Area Ratio Silicon Microchannels Fabricated by Electrochemical Etching
Theoretical investigation of three dimensional p-n junctions for improvement of silicon solar cell e
Investigation of photoelectrochemical etching of textured silicon in solar cells