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Growth and band alignment of Bi2Se3 topological insulator on Hterminated Si(111) van der Waals surfa
  • ISSN号：0003-6951
  • 期刊名称：Applied Physics Letters
  • 时间：2013.2.21
  • 页码：074106-
  • 相关项目：Bi2Se3基拓扑绝缘体薄膜的Si异质外延生长研究
作者： Handong Li|Lei Gao|Hui Li|Gaoyun Wang|Jiang Wu|Zhihua Zhou|Zhiming Wang|
同期刊论文项目
Bi2Se3基拓扑绝缘体薄膜的Si异质外延生长研究
期刊论文 7 著作 2
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