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Surface Wettabiliy of Nitrogen Plasma-Implanted Silicon
  • 期刊名称：Nuclear Instruments and Methods in Physics Researc
  • 时间：0
  • 页码：xx (2005)xxx-xxx (已
  • 语言：英文
  • 相关项目：Si(C)-N系薄膜的血液接触活化机理及抗凝血优化
作者： G. J. Wan|R. K. Y. Fu|P. Yang|J. P. Y. Ho|X. Xie|N. Huang|and P. K.Chu*|
同期刊论文项目
Si(C)-N系薄膜的血液接触活化机理及抗凝血优化
期刊论文 9 会议论文 5
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