以光敏微晶玻璃和PDMS为材料,通过光化学加工和等离子体改性,制备了光敏微晶玻璃-PDMS微流控芯片,并对该芯片的电渗性能进行了初步的研究。结果表明,该芯片的制作工艺简单,且电渗性能稳定。芯片的电渗速度随缓冲液浓度的增大而增加,表面活性剂的加入可以改善电渗速度,电压在1.8kV内与电渗速度具有线性关系。
Through the photo-chemical maching process and plsam modification, the microfluidic chips were prepared with photo-active glass-ceramic as substrate and poly(dimethylsiloxane) (PDMS) as cover plate. The results show that the fabrication process of the microfluided chip is simplified, and the electroosmosis property is steady. The viloeity of the electroosmosis of the microfluided chip is growing with the increasing of the buffer concentration, and the using of surfactants could improve the vilocity of the electroosmosis. The voltage within 1 800 V has good line relationship with the vilocity of the electroosmosis.