中文摘要：

[目的]以尿中多环芳烃代谢产物2-羟基萘（2-NAP）、2-羟基芴（2-FLU）、9-羟基菲（9-PHE）和1-羟基芘（1-OHP）作为生物标志,评价焦化厂工人体内多环芳烃（PAHs）暴露水平,探讨4种PAHs代谢物浓度的影响因素。[方法]对某焦化厂焦炉工437人（接触组）及非焦炉工167人（对照组）进行问卷调查,高效液相色谱-荧光检测法测定两组工人晨尿中4种多环芳烃代谢物水平。[结果]接触组尿中羟基代谢产物2-NAP、2-FLU、9-PHE和1-OHP浓度的中位数[分别为0.725、0.300、0.092、0.059μg/mmo L（以Cr计）]均显著高于对照组[分别为0.615、0.197、0.065、0.040μg/mmo L（以Cr计）]（P〈0.01）;逐步logistic回归分析显示吸烟量每增加一个等级,致2-NAP发生高浓度的可能性增加了3.393倍;接触组的代谢物2-NAP、2-FLU、9-PHE和1-OHP发生高浓度的可能性分别是对照组的1.665、3.399、2.185和2.905倍。[结论]影响人群尿中多环芳烃代谢物浓度的主要因素是工种和吸烟,其中2-FLU与1-OHP是焦炉工职业暴露敏感的生物标志,而2-NAP是吸烟暴露敏感的生物标志。

英文摘要：

[Objective] Using urinary polycyclic aromatic hydrocarbon（PAHs） metabolites including 2-hydroxynathalene（2-NAP）, 2-hydroxyfluorene（2-FLU）, 9-hydroxyphenanthrene（9-PHE）, and 1-hydroxypyrene（1-OHP） as biomarkers, to evaluate the internal exposure levels of PAHs and explore related influencing factors of selected PAHs metabolites among coke oven workers. [Methods] Coke oven workers（n=437） and non-coke oven workers（n=163） were recruited from a coking plant to complete a questionnaire survey. Morning urine samples were collected and four urinary metabolites were measured by high performance lipid chromatography-fluorescence detection. [Results] The median urinary concentrations of urinary metabolites 2-NAP, 2-FLU, 9-PHE, and 1-OHP in coke oven workers（0.725, 0.300, 0.092, and 0.059 μg/mmo L, respectively, by Cr） were higher than those in non-coke oven workers（0.615, 0.197, 0.065, and 0.040 μg/mmo L, respectively, by Cr）（P〈0.01）. The results of step-wise logistic regression analysis showed that each unit of smoking consumption was associated with 3.393 times higher of 2-NAP. The odds ratios of 2-NAP, 2-FLU, 9-PHE, and 1-OHP were 1.665, 3.399, 2.185, and 2.905 for coke oven workers to non-coke oven workers. [Conclusion] The major factors influencing PAHs metabolite concentrations are occupation and smoking. Among selected PAHs metabolites, 2-FLU and 1-OHP were sensitive biomarkers of occupational exposure in coke oven workers, while 2-NAP was a sensitive biomarker of smoking exposure.