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Impact of Deposition Temperature of the Silicon Oxide Passivation on the Performance of Indium Zinc
  • ISSN号：0021-4922
  • 期刊名称：Japanese Journal of Applied Physics
  • 时间：2012.7
  • 页码：076501-076501
  • 相关项目：金属氧化物薄膜晶体管稳定性机理的研究
作者： Xu, Hua|Luo, Dongxiang|Xiong, Nana|Peng, Junbiao|
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金属氧化物薄膜晶体管稳定性机理的研究
期刊论文 45
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