位置：成果数据库 > 期刊 > 期刊详情页
Damage/ablation morphology of laser conditioned sapphire under 1064 nm laser irradiation
  • ISSN号：0030-3992
  • 期刊名称：Optics and Laser Technology
  • 时间：2012.6.6
  • 页码：948-953
  • 相关项目：离子束表面处理提升负载能力的规律和工艺研究
作者： Jiang, Y.|Xiang, X.|Wang, H. J.|Yuan, X. D.|He, S. B.|Lv, H. B.|Zheng, W. G.|Zu, X. T.|
同期刊论文项目
离子束表面处理提升负载能力的规律和工艺研究
期刊论文 20
同项目期刊论文
Mitigation of laser damage growth in fused silica by using a non-evaporative technique
Rear-surface light intensification caused by a Hertzian-conical crack in 355-nm silica optics
Mitigation of surface damage growth by hydrofluoric acid etching combined with carbon dioxide laser
熔石英表面损伤修复点上烧蚀碎片的分类与去除
A new method to investigate the intense pulsed ion beam ablation of silica
High temperature thermal behaviour modeling of large-scale fused silica optics for laser facility
Incident laser modulation of a repaired damage site with a rim in fused silica rear subsurface
Characterization of 355 nm laser-induced damage of mitigated damage sites in fused silica
Simulation of field intensification induced by pit-shaped crack on fused silica rear-surface
Near-field modulation of lateral cracks
形状与位置对断点划痕场分布的影响研究
Two localized CO2 laser treatment methods for mitigation of UV damage growth in fused silica
Optical characterization and laser damage of fused silica optics after ion beam sputtering
Near-field modulated simulation of repaired site contained crack or bubble in fused silica subsurfac
CO2激光光栅式扫描修复熔石英表面缺陷的实验研究与数值模拟
聚丙烯酰胺凝胶法制备大孔α-氧化铝及其发光性能研究
裂纹或气泡对熔石英损伤修复坑场调制的近场模拟
熔石英后表面坑点型划痕对光场调制的近场模拟
横向划痕对光场调制的近场模拟