中文摘要：

摘要电弧离子镀工艺中电弧蒸发产生的大颗粒污染严重影响了所沉积涂层的性能。为了从源头上解决大颗粒难题，本文提出了一种新的旋转横向磁场的设计思路，通过频率和强度可调且覆盖整个靶面的旋转横向磁场控制弧斑的运动。通过有限元模拟磁场的分布，对旋转横向磁场控制的电弧离子镀弧源进行了优化设计。并根据方案制作了旋转磁场发生装置及其电源，使该弧源的旋转磁场具有多模式可调频调幅的功能，用以改善弧斑的放电形式，提高靶材刻蚀均匀性和靶材利用率，减少靶材大颗粒的发射，用以制备高质量的薄膜以及功能薄膜，以拓展电弧离子镀的应用范围。

英文摘要：

Abstract A noveltype of arc source with rotating transverse magnetic field was developed to solve the problem of micro-particle contamination, originated from arc evaporation, in the film deposition by arc ion plating. With the newly-de- veloped arc source, the arc spot easily covers the entire target surface, and its movement is well controlled by adjusting the frequency and intensity of the rotating transverse magnetic field. The magnetic field distribution was simulated in finite el- ement method to optimize the arc source design. The novel arc source is capable of working in multi-mode with adjustable amplitude and frequency to meet the requirement of a wide range of applications. Besides, its many advantages over the conventional arc source include the reduction of particle emission, enhancement of film quality, and improvement of arc discharge, target utilization, and target-etching uniformity.