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Thermal stability, phase and interface uniformity of Ni-Silicide formed by Ni-Si solid-state reactio
  • 期刊名称：Thin Solid Films
  • 时间：0
  • 页码：462-463, 146-150 (2004).
  • 语言：英文
  • 相关项目：多层薄膜固相反应与Co-Ni系硅化物薄膜外延及应用研究
作者： 屈新萍|蒋玉龙|茹国平等|
同期刊论文项目
多层薄膜固相反应与Co-Ni系硅化物薄膜外延及应用研究
期刊论文 15 会议论文 3
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