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A contact-mechanics-based model for general rough pads in chemical mechanical polishing processes
  • ISSN号：0013-4651
  • 期刊名称：Journal of the Electrochemical Society
  • 时间：0
  • 页码：H601-H611
  • 语言：英文
  • 相关项目：工艺偏差下的大规模互连线电路与非线性电路分析方法研究
作者： Zeng, Xuan|Feng, Chunyang|Cai, Wei|Tao, Jun|Yan, Changhao|
同期刊论文项目
工艺偏差下的大规模互连线电路与非线性电路分析方法研究
期刊论文 21 会议论文 13 获奖 14 专利 3
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