介绍了一种基于原子力显微镜(AFM)的激光近场增强纳米加工方法。探讨了作为主要影响因素的激光场增强效应,用时域有限差分法对AFM探针下光场的空间分布进行了数值分析。研究了飞秒激光入射到AFM探针的PMMA材料的图形化,在PMMA材料表面加工了不同宽度的线条和字母。利用AFM对所得纳米图形进行了原位测试。在激光参数未经优化的情况下,其线宽可达100nm,超过了实验室飞秒激光远场加工的分辨能力(200nm)。
A new nano-process technique beyond conventional optical lithography was introduced. As the main mechanisms, field enhancement effect was discussed. Using Finite Difference Time Domain method(FDTD), the near-field optical distribution of metallic tips was simulated. Nanofabrication on PMMA surfaces using an Atomic Force Microscope(AFM) tip under femto-second laser irradiation was investigated. Various lines and letters of different widths were processed, then fabricated patterns were tested by the same AFM tip in situ. Without optimization of the laser parameters, 100 nm resolution which is better than far field fabrication of our research group (-200 nm) was obtained.