基于直流弧光放电PCVD金刚石薄膜沉积设备的特点,设计开发了基底自动控温系统。将该系统应用于金刚石薄膜的制备中,并采用SEM、Raman光谱等测试方法对所制备的薄膜的形貌、品质进行了表征。结果证明该系统具有较好的稳定性,其应用时所制备的金刚石薄膜的品质明显得到提高,具有广泛的应用前景。
A temperature auto control system had been developed for a substrate holder apparatus on the basis of the DC arc discharge plasma CVD growth system.The CVD diamond films were deposited by DC arc discharge plasma using the novel technique above mentioned.The morphology and quality of diamond films were analyzed by scanning electron microscopy(SEM) and laser Raman spectroscopy.The results showed that the system is steady,the quality of diamond films is improved using substrate temperature control system,and has very broad applicable prospect