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Study on Interface Adhesion between Phase Change Material Film and SiO2 Layer by Nanoscratch Test
  • ISSN号：0021-4922
  • 期刊名称：JAPANESE JOURNAL OF APPLIED PHYSICS
  • 时间：2011.9.9
  • 页码：091402-
  • 相关项目：Si基新型相变材料（Si-Sb-Te）及其器件基础研究
作者： Zhou, Xilin|Wu, Liangcai|Song, Zhitang|Rao, Feng|Ren, Kun|Peng, Cheng|Guo, Xiaohui|Liu, Bo|Feng, Songlin|
同期刊论文项目
Si基新型相变材料（Si-Sb-Te）及其器件基础研究
期刊论文 39
同项目期刊论文
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Study on the crystallization behaviors of Si2Sb2Tex materials
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Nano-scale gap filling and mechanism of deposit-etch-deposit process for phase-change material
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Nitrogen incorporated GeTe phase change thin film for high-temperature data retention and low-power
Investigation of phase transition behaviors of the nitrogen-doped Sb-rich Si-Sb-Te films for phase-c
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Direct observation of metastable face-centered cubic Sb2Te3 crystal
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