综述了多种图案化制备ZnO纳米线阵列的技术,包括电子束光刻技术、纳米球蚀刻技术、激光干涉光刻技术、纳米压印技术和嵌段共聚物蚀刻技术等。介绍了图案化ZnO纳米线阵列在传感器、太阳能电池和UV检测器等功能器件中的应用进展,分析了图案化ZnO纳米线阵列制备与应用中的优点、意义及存在的问题,并展望了其未来发展趋势。
Various patterning technologies of ZnO nanowire arrays, such as electron beam lithography, nano- sphere lithography, laser interferometric lithography, nanoimprint lithography and block copolymer nanolithography, are reviewed. And the applications of patterned ZnO nanowire arrays in functional devices, such as sensors, UV de- tectors and solar cells, etc, are introduced. The advantages, values and problems in the preparation and application of patterned ZnO nanowire arrays are analyzed, and its development trend is previewed.