中文摘要：

选取NaCl-KCl-NaF—NazB407摩尔比为2：2：1：0．04的熔盐通过脉冲电沉积的方法在硅钢表面进行渗硼，通过测定不同沉积温度和沉积时间下的渗硼层厚度，求出熔盐脉冲电沉积渗硼过程中硼的扩散激活能和扩散常数。计算并验证了利用求得的扩散激活能、扩散常数和公式可以准确计算某一温度下熔盐脉冲电沉积过程中硼在硅钢中的扩散系数。与常规渗硼相比，脉冲电沉积渗硼的扩散激活能在数值上与其属于同一数量级，但扩散常数有所提高，进而有效提高了脉冲电沉积渗硼的扩散系数。

英文摘要：

Boronized layer on the surface of silicon steel was produced by pulse electrodeposition in NaC1 ： KC1 ： NaF ： Na2B407 =2 ： 2 ： 1 ： 0.04 （mole ratio）. The diffusion parameters including diffusion activation energy and diffusion constant were obtained by measuring the thickness of boronized layer of sillicon steel in different depositon temperatures and deposition times. The diffusion coefficient of boron in silicon steel under a certain temperature during molten salt pulse electrodeposition can be calculated according to the diffusion activation energy, the diffusion constant and formula. And the accuracy of the diffusion coefficient was verified. Comparing with conventional boriding, the diffusion activation energy of boron during pulse electrodeposition is the same order of magnitude, but the diffusion constant of boron during pulse electrodeposition becomes larger, so the diffusion coeffcient of boron increases efficiently during pulse electrodeposition.