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Cascadic multigrid algorithm for robust inverse mask synthesis in optical lithography
  • ISSN号：1932-5150
  • 期刊名称：Journal of Micro/ Nanolithography, Mems, and Moems
  • 时间：2014.6
  • 页码：-
  • 相关项目：高性能数字制造装备的基础研究
作者： Lv, Wen|Lam, Edmund Y.|Wei, Haiqing|Liu, Shiyuan|
同期刊论文项目
高性能数字制造装备的基础研究
期刊论文 128 会议论文 5 获奖 11 专利 12 著作 2
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