利用氢基质生物膜反应器(Hydrogen-based membrane biofilm reactor,MBfR)研究了NO_3^--N负荷、SO_4^2-负荷、As(Ⅴ)负荷、氢分压对水中砷去除效果的影响.结果表明,随着NO_3^--N进水负荷的增加,As(Ⅴ)和SO_4^2-还原受到明显抑制,系统产生As(Ⅲ)和NO_2^-的积累;随着SO_4^2-进水负荷的增加,反应器内总砷去除率由78.6%(25 mg·L-1SO_4^2-降低至1.1%(200 mg·L^-1SO_4^2-,而此时NO_3^--N的去除基本不受影响.同时,随着进水As(Ⅴ)负荷从0.25 mg·L^-1增至2 mg·L^-1,出水SO_4^2-浓度明显升高,反应器内总砷去除率从70.0%降低至47.3%,而此时NO_3^--N的去除基本不受影响;当氢分压低于0.06 MPa时,提高氢分压可降低出水As(Ⅴ)浓度,当氢分压高于0.06 MPa后便不再是控制因素.由于体系中氢自养还原微生物会优先利用NO_3^--N和SO_4^2-作为电子受体,因此,为了保证As(Ⅴ)的高效还原去除,必须控制氢分压在0.05~0.07 MPa之间.
A continuous stirred hydrogen-based membrane biofilm reactor (MBfR) was used to study the effects of influent concentration of NO3--N, SO42- ,As( V ) and H2 pressure for the removal of As( V ) in water. The results demonstrated that As( V ) and SO24- reduction was inhibited by the increase of NO3-N influent concentration. NO2- began to accumulate at the NO3-N concentration of 20 mg. L-1 and As( m ) was accumulated because of the shortage of S2-. When influent NO-3-N concentration was higher than 50 mg. L-1, the total As removal rate was nearly zero. As( V ) and SO2-4- reduction was suppressed with the increase of SO2-4- concentration, and total As removal efficiency decreased from 78.6% ( influent SO2-4- 25 mg. L-1 ) to 1.1% (influent SO2-4- 200 mg. L-1). As( V ) concentration had a great influence on As( V ) and SO2-4- reduction rates. Total As removal efficiency decreased from 70.0% (influent As( V ) 0.25 mg. L-1 ) to 47.3% (influent As ( V ) 2 mg. L-1 ). Higher H2 pressure, no more than 0.06 MPa, would increase As( V ) reduction flux. As( V ) removal would be insensitive to H2 pressure. But the reduction of NO-3-N and SO2- compete more strongly for electron donor ( H2 ) than As( V ). In order to keep high removal efficiency of total As, H2 pressure should be controlled in the range of 0.05 - 0.07 MPa.