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Influence of co-precipitation of copper and nickel on the formation of a denuded zone in Czochralski silicon
  • ISSN号:1674-4926
  • 期刊名称:《半导体学报:英文版》
  • 时间:0
  • 分类:TN304.12[电子电信—物理电子学] X503.225[环境科学与工程—环境工程]
  • 作者机构:[1]Department of Materials Science and Engineering, College of Materials, Xiamen University, Xiamen, 361005, China, [2]State Key Laboratory of Silicon Materials, Zhejiang University, Hangzhou 310027, China
  • 相关基金:Project supported by the National Natural Science Foundation of China (No. 50902116) and the Opening Project of State Key Laboratory of Silicon Materials, China (No. SKL2012-17).
中文摘要:

The influence of co-precipitation of copper and nickel on the formation of a denuded zone(DZ) in Czochralski silicon(Cz Si) was systematically investigated by means of etching and optical microscopy(OM).It was found that,for conventional high-low-high annealing(CFA),the DZ could be obtained in all specimens contaminated by copper and nickel co-impurity at different steps of the heat treatment,indicating that no copper precipitates or nickel precipitates were generated in the region just below the surface.However,for rapid thermal annealing(RTA)-low-high annealing,the tendency is not the same; the DZ could not be found in the specimen which was contaminated by copper and nickel contamination before the first RTA annealing.On the basis of the experimental results,it was supposed that the concentration and distribution of the vacancies generating during the RTA can influence the distribution of copper precipitation and nickel precipitation along the cross-section of Cz Si significantly,and thus influence the formation of the DZ to a great extent.

英文摘要:

The influence of co-precipitation of copper and nickel on the formation of a denuded zone (DZ) in Czochralski silicon (Cz Si) was systematically investigated by means of etching and optical microscopy (OM). It was found that, for conventional high-low-high annealing (CFA), the DZ could be obtained in all specimens contaminated by copper and nickel co-impurity at different steps of the heat treatment, indicating that no copper precipitates or nickel precipitates were generated in the region just below the surface. However, for rapid thermal annealing (RTA)-low-high annealing, the tendency is not the same; the DZ could not be found in the specimen which was contaminated by copper and nickel contamination before the first RTA annealing. On the basis of the experimental results, it was supposed that the concentration and distribution of the vacancies generating during the RTA can influence the distribution of copper precipitation and nickel precipitation along the cross-section of Cz Si significantly, and thus influence the formation of the DZ to a great extent.

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期刊信息
  • 《半导体学报:英文版》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国电子学会 中国科学院半导体研究所
  • 主编:李树深
  • 地址:北京912信箱
  • 邮编:100083
  • 邮箱:cjs@semi.ac.cn
  • 电话:010-82304277
  • 国际标准刊号:ISSN:1674-4926
  • 国内统一刊号:ISSN:11-5781/TN
  • 邮发代号:2-184
  • 获奖情况:
  • 90年获中科院优秀期刊二等奖,92年获国家科委、中共中央宣传部和国家新闻出版署...,97年国家科委、中共中央中宣传部和国家新出版署三等奖,中国期刊方阵“双效”期刊
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  • 被引量:7754