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Influence of the tensile strain on CH4 dissociation on Cu(100) surface: A theoretical study
  • ISSN号：0169-4332
  • 期刊名称：Appl. Surf. Sci.
  • 时间：2015.11.12
  • 页码：826-832
  • 相关项目：化学气相沉积法制备石墨烯生长机理的计算机模拟研究
作者： Wang Ying|Jiao Menggai|Tang Hao|Wu Zhijian|
同期刊论文项目
化学气相沉积法制备石墨烯生长机理的计算机模拟研究
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