中文摘要：

磁场分布对磁控溅射稳定性、离化率、靶材利用率及成膜质量都有重要影响，合理分布可使靶材附近等离子体分布均匀，不同位置溅射速率差减小，靶材刻蚀范围增大，靶材寿命延长，溅射过程稳定性提高。本文针对六靶复合表面改性设备，用有限元法对磁场进行模拟，得到较理想的磁场分布，为优化设计提供理论依据。

英文摘要：

In magnetron sputtering, the magnetic field determines the sputtering stability, ionization rate, target utilization coefficient and films quality. Reasonable magnetic field distribution leads to a glow discharge distribution of desirable uniformity, hence improved target sputtering rate at different areas, extended sputtering area, prolonged target life and increased stability of the sputtering process. In this paper, the magnetic field of a hexagon target system is optimized by finite element method, and this provides a theoretic basis for optimization of the magnetron sputtering system.