介绍了一种硅微机械FP腔器件,该器件作为光学滤波器、光学衰减器等在光纤通信技术中具有广泛应用。采用化学气相沉积、刻蚀、金属蒸发等工艺对该器件进行加工,并利用湿法腐蚀释放使其形成悬空结构,悬空膜采用静电激励驱动。分析了器件的基本原理、工作范围、静电激励的阈值电压等特性,并指出了影响阈值电压大小的因素。
A device of silicon micromachined Fabry-Perot cavity is introduced. It can be extensive used in the optical fiber communication, such as optical filter and optics attenuator. The device is fabricated by general surface processes, such as LPCVD, RIE, chemical etching and evaporating metal-coating. The silicon nitride film which is suspended above the silicon substrate, is driven by an electrostatic force. The basic principle, operating range and threshold voltage of the device are analyzed, and the factors of influence threshold voltage are discussed. By means of the finite element method, the mechanical, the coupling and the response characteristics of the device are analyzed.