本文针对红外光学材料对宽波段透过的要求,采用HFCVD法在硅基体上制备了红外增透的金刚石薄膜。设计了高红外透过率的膜系结构,探讨了基体处理方式、单面、双面涂层工艺和厚度对红外透过率的影响,并给出了相关的光谱测试结果和金刚石薄膜的微观形貌、结构表征。结果表明:双面涂层金刚石薄膜工艺具有优异的双波段红外性能,在3.0~5.0μm波段的最大红外透过率达到80%,接近于理论值;在8.0~14.0μm波段的最大增透率达18%,最大红外透过率达65%,与天然金刚石的透过率接近。这对于红外光学系统的应用具有十分重要的意义。
According to the request of broadband infrared materials,high performance infrared two-band antireflection diamond film deposited on silicon substrate was prepared by hot filament chemical vapor deposition method.Some factors influencing on infrared transmission are discussed,such as the substrate treatment methods,the technology of diamond films coated on single face or double faces,the film thickness,etc.Related spectral test results,microstructure of diamond films and structure characterization were given.The results show that the technology of double face coating with diamond film has excellent infrared two-band antireflection performance.The peak transmission is about 80% at the wave band 3.0~5.0 μm,that is close to the theory value.When the wave band is 8.0~14.0 μm,the maximum antireflection is 18%,the peak transmission is about 65%,which is close to that of natural diamond.This has important significance for the applications of infrared optical systems.