采用短波紫外光(UV)对十八烷基三氯硅烷(OTS)自组装单分子层(SAMs)进行刻蚀,利用化学液相法在OTS-SAMs模板表面制备出铁酸铋(BiFeO3)图案化薄膜。通过接触角、X射线衍射(XRD)、扫描电镜(SEM)、X射线能谱(EDS)等测试手段对OTS膜和BiFeO3薄膜进行表征。结果表明:以OTS为模板利用化学液相法成功制备出边缘轮廓清晰、条纹宽度为10~20μm的BiFeO3图案化薄膜。
Different kinds of micro-patterns were fabricated within octadecyhrichlorosilane (OTS) self-assembled monolayers (SAMs) utilizing UV lithography. The BiFeO3 pattern films have been formed on silanol SAMs by the chemical solution deposition(CSD). The crystal phase composition, microstructure and topography of the as-prepared films were characterized by contact angle tester, X-ray diffraction (XRD), scanning electron microseopy(SEM) and energy disperse spectroscopy (EDS). The large contrast between octadecyl regions and silanol regions suggests selective deposition of BiFeO3 film on the silanol regions with deposited line width of 10-20 μm.