中文摘要：

极紫外光刻（EUVL）技术能突破30 nm技术节点、可应用于大规模工业生产,是下一代光刻技术的核心之一。极紫外（EUV）光源是EUVL的源头,寻找可满足EUVL的合适光源是解决问题的关键,世界上许多发达国家都在积极探索EUVL光源的研究。属于4种气体放电方式之一的毛细管放电具有较高的能量转换效率,将毛细管放电装置应用于EUV光源研究存在很多优势。基于国家长期发展战略的需要和紧跟世界科技前沿的策略,我国建立了国内首台毛细管放电EUVL光源演示装置。经放电试验和测谱分析,装置可满足EUVL光源研究的需要。

英文摘要：

Extreme Uhraviolet Lithography （EUVL） is one core of next generation lithography tech- nology which,breaking through the 30 nm technology node, could be used to high-volume industrial production. As Extreme Ultraviolet （EUV） source is the headstream of EUVL,searching a feasible source for EUVL becomes such a pivotal task that many developed countries in the world actively probed into it. Capillary discharge ,one of four types of discharge produced plasmas, has so large conversion efficiency of energy that it takes lots of advantages in applying capillary discharge device to EUV source research. Based on the strategic requirement for the national long-term development and the policy in keeping pace with the frontline of science and technology in the world, China estab- lished its first set of capillary discharge EUVL source demonstrative device which,by discharging test and analyzing spectrum, could satisfy the need for EUVL source investigation.