采用定向凝固与选择性腐蚀复合工艺,获得NiAl-W纳米多孔阵列。通过定向凝固速率可调节棒状NiAl-W共晶中棒状W相的间距和直径,电化学选择性腐蚀去除W相后,在NiAl基体表面上形成间距和孔径可调的多孔阵列。由于孔径尺度的限制,孔列在电势0.5V连续腐蚀2-3h后受到极大的阻力。
The nanoporous arrays on the surface of NiAl-W eutectic alloy were obtained through a combined process of directional solidification and selective dissolution.The spacing and diameter of rod-like tungsten phases in the NiAl-W pseudobinary eutectic both can be tuned through the selection of growth rates during directional solidification.Thus,the spacing and porous diameter of porous array on the surface of NiAl matrix could be also adjusted after removing rod-like W phase through the electrochemical selective dissolution.Because of the limitation of the pore size,the deepening of the depth of etching porous zone has been suffered an enormous hindrance after etching of 2—3 hours at the potential of 0.5 V.