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Additive-aided electrochemical deposition of bismuth telluride in a basic electrolyte
  • ISSN号：1674-4799
  • 期刊名称：International Journal of Minerals Metallurgy and M
  • 时间：0
  • 页码：489-493
  • 语言：英文
  • 分类：TQ153[化学工程—电化学工业] TB383[一般工业技术—材料科学与工程]
  • 作者机构：[1]State Key Laboratory of Silicon Materials, Department of Materials Science and Engineering, Zhejiang University, Hangzhou 310027, China
  • 相关基金：[This work was financially supported by the National Natural Science Foundation of China （770.50731006）.]
  • 相关项目：高性能热电材料的非平衡态制备科学和电声输运协调
作者： Qiu, Wu-jun|Zhu, Tie-jun|Zhao, Xin-bing|Zhang, Sheng-nan|
关键词： 电化学沉积, 电镀添加剂, 碲化铋, 电解质, X射线衍射图, 沉积电位, 晶体结构, 沉积膜, thin films, thermoelectric materials, electrochemical deposition, bismuth telluride, basic electrolyte
中文摘要：

有二 cationic plating 添加剂， polydiaminourea 和 polyaminosulfone 的新基本电解质，在 nickel-plated 铜陪衬上为铋碲化物电影的电气化学的免职被调查。碲开始将在这电解质比铋 -0.5 V 在更高潜在的 -0.35 V 扔。当免职潜力从 -1 衰退到 -1.25 V 时， tellurium-to-bismuth 比率增加，显示在更高的潜力的运动地更快的铋免职。同样扔的电影展示好粘附到底层和光滑的形态学，并且把将近非结晶的水晶结构被 X 光检查衍射模式揭示了。

英文摘要：

A new basic electrolyte with two cationic plating additives, polydiaminourea and polyaminosulfone, was investigated for the electrochemical deposition of the bismuth telluride film on a nickel-plated copper foil. Tellurium starts to deposit at a higher potential （-0.35 V） than bismuth （-0.5 V） in this electrolyte. The tellurium-to-bismuth ratio increases while the deposition potential declines from -1 to -1.25 V, indicating a kinetically quicker bismuth deposition at higher potentials. The as-deposited film features good adhesion to the substrate and smooth morphology, and has a nearly amorphous crystal structure disclosed by X-ray diffraction patterns.

同期刊论文项目
高性能热电材料的非平衡态制备科学和电声输运协调
期刊论文 148 获奖 2 专利 10
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期刊信息
  • 《矿物冶金与材料学报：英文版》
  • 主管单位:教育部
  • 主办单位:北京科技大学
  • 主编：杨天钧
  • 地址：北京市海淀区学院路30号
  • 邮编：100083
  • 邮箱：journal@ustb.edu.cn
  • 电话：010-62332875
  • 国际标准刊号：ISSN：1674-4799
  • 国内统一刊号：ISSN：11-5787/TF
  • 邮发代号:
  • 获奖情况:
  • 国内外数据库收录:
  • 俄罗斯文摘杂志,美国化学文摘（网络版）,荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,美国科学引文索引（扩展库）,日本日本科学技术振兴机构数据库
  • 被引量:113