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Surface-energy triggered phase formation and epitaxy in nanometer-thick Ni1-xPtx silicide films
  • ISSN号：0003-6951
  • 期刊名称：Applied Physics Letters
  • 时间：2010.1.18
  • 页码：1-3
  • 相关项目：超薄可控金属硅化物的形成工艺及机理研究
作者： Akerman, Johan|Ostling, Mikael|Hultman, Lars|Zhang, Shi-Li|
同期刊论文项目
超薄可控金属硅化物的形成工艺及机理研究
期刊论文 22 会议论文 4
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