Thermal stability and data retention of resistive random access memory with HfOx/ZnO double layers
- ISSN号:1674-1056
- 期刊名称:《中国物理B:英文版》
- 时间:0
- 分类:TP333.8[自动化与计算机技术—计算机系统结构;自动化与计算机技术—计算机科学与技术] TQ132.41[化学工程—无机化工]
- 作者机构:School of Physics and Information Engineering, Fuzhou University, Fuzhou 350108, China
- 相关基金:the National Natural Science Foundation of China (Grant Nos. 61006003 and 61674038), the Natural Science Foundation of Fujian Province, China (Grant Nos. 2015J01249 and 2010J05134), the Science Foundation of Fujian Education Department of China (Grant No. JAT160073), and the Science Foundation of Fujian Provincial Economic and Information Technology Commission of China (Grant No. 83016006).
关键词:
随机存取存储器, 热稳定性, 氧化锌, 低电阻, 肖特基发射, 开关电流, 记忆, 和数, resistive random access memory (RRAM), thermal stability, data retention, double layer
中文摘要:
Corresponding author.E-mail: yunfeng.lai@fzu.edu.cn