中文摘要：

采用电子束热蒸发技术在石英基底上制备了H4薄膜,并对其光学和激光损伤特性进行了研究。根据透射率谱计算出薄膜的光学带隙发现,光学带隙随着沉积速率的降低而增大,其值大小在4.66～4.73eV。椭偏测试结果表明,当沉积速率从0.92nm/s、0.17nm/s、0.08nm/s降低到0.03nm/s时,薄膜折射率从1.955 2、1.919 8、1.901 8降低到1.895 4（1 064nm）。所有样品的消光系数量级均优于10-5,说明薄膜表现出极小的吸收。薄膜的激光损伤形貌和激光损伤阈值（LIDT）受沉积速率的影响不大,同一激光能量作用下,薄膜的损伤斑大小基本一致,但0.92nm/s时制备的薄膜,其损伤区与未损伤区存在相互交错现象。当沉积速率从0.03nm/s变化到0.92nm/s时,薄膜激光损伤阈值在16～17J/cm^2（1 064nm,10ns）之间。

英文摘要：

H4 films were prepared on quartz substrates by electronic beam vapor deposition technique,and the optical and laser damage properties were investigated.Based on transmittances of the samples,the calculated optical band gaps are 4.66～4.73 eV,which are increased with decrease of the deposition rate.The ellipsometric results show that the refractive index is decreased from 1.9552,1.9198,1.9018 to 1.895 4（1 064nm）with the decrease of deposition rate from 0.92nm/s,0.17nm/s,0.08nm/s to0.03nm/s.For all the samples prepared in this paper,the extinction coefficients are all below 10-5.The deposition rates almost can not affect the laser damage morphology and properties of H4 films.When all the samples are broken at the same laser energy,similar damage spot sizes are obtained.The boundary between damage and un-damage areas of the film prepared at the deposition rate of 0.92nm/s is interlocking while others are not.The laser-induced damage thresholds（LIDT）of the films are stable with the value of 16～17J/cm^2（1 064 nm,10ns）while the deposition rates change from 0.03nm/s to 0.92nm/s.