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高温退火处理对TiAlSiN硬质薄膜的微观结构与硬度的影响分析
  • ISSN号：0023-074X
  • 期刊名称：《科学通报》
  • 时间：0
  • 分类：TQ342.2[化学工程—化纤工业]
  • 作者机构：[1]西安交通大学金属材料强度国家重点实验室,西安710049
  • 相关基金：国家自然科学基金（50671079,50531060）、国家重点基础研究发展计划新材料领域项目（2004CB619302）和教育部新世纪优秀人才支持计划（NCET-04-0934）资助项目
作者： 王昕[1], 徐建华[1], 马胜利[1], 徐可为[1]
关键词： 弧离子增强反应, 磁控溅射, 高温退火, TiAlSiN, 薄膜
中文摘要：

用弧离子增强反应磁控溅射方法,在高速钢（W18Cr4V）基体上沉积出具有较高Al,Si含量的TiAlSiN多元硬质薄膜,研究了不同温度退火后薄膜的微观结构和硬度变化.结果表明：由于沉积速率较高和沉积温度较低,沉积态的TiAlSiN薄膜主要形成非晶结构;高温退火后,TiAlSiN薄膜由非晶转变为纳米晶/非晶复合结构;1000℃以下退火后产生的晶体为AlN及TiN;1100℃以上退火后晶体为TiN,其余为非晶结构;1200℃时薄膜发生氧化,生成Al2O3,表明TiAlSiN薄膜具有相当高的抗氧化温度.TiAlSiN薄膜随退火温度升高晶粒尺寸逐渐增大,高温退火后平均晶粒尺寸小于30nm.沉积态TiAlSiN薄膜具有较高的显微硬度（HV0.2N=3300）,但随退火温度的升高,硬度逐渐降低,800℃退火后硬度降低至接近TiN硬度值（HV0.2N=2300）.

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期刊信息
  • 《科学通报》
  • 北大核心期刊（2011版）
  • 主管单位:中国科学院
  • 主办单位:中国科学院
  • 主编：周光召
  • 地址：北京东黄城根北街16号
  • 邮编：100717
  • 邮箱：csb@scichina.org
  • 电话：010-64036120 64012686
  • 国际标准刊号：ISSN：0023-074X
  • 国内统一刊号：ISSN：11-1784/N
  • 邮发代号:80-213
  • 获奖情况:
  • 首届国家期刊奖,中国期刊方阵“双高”期刊,第三届中国出版政府奖
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  • 美国化学文摘（网络版）,美国数学评论（网络版）,美国工程索引,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊（2004版）,中国北大核心期刊（2008版）,中国北大核心期刊（2011版）,中国北大核心期刊（2014版）,中国北大核心期刊（2000版）
  • 被引量:81792