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Modeling and analysis of the HPM pulse-width upset effect on CMOS inverter
  • ISSN号:1674-4926
  • 期刊名称:《半导体学报:英文版》
  • 时间:0
  • 分类:TN713[电子电信—电路与系统] TN015[电子电信—物理电子学]
  • 作者机构:[1]Key Laboratory of Ministry of Education for Wide Band-Gap Semiconductor Materials and Devices, School of Microelectronics,Xidian University, Xi'an 710071, China
  • 相关基金:Project supported by the National Natural Science Foundation of China (No. 60776034) and the State Key Development Program for Basic Research of China (No. 2014CB339900).
中文摘要:

We derive analytical models of the excess carrier density distribution and the HPM(high-power microwave) upset susceptibility with dependence of pulse-width,which are validated by the simulated results and experimental data.Mechanism analysis and model derivation verify that the excess carriers dominate the current amplification process of the latch-up.Our results reveal that the excess carrier density distribution in P-substrate behaves as pulse-width dependence.The HPM upset voltage threshold V_p decreases with the incremental pulsewidth,while there is an inflection point which is caused because the excess carrier accumulation in the P-substrate will be suppressed over time.For the first time,the physical essence of the HPM pulse-width upset effect is proposed to be the excess carrier accumulation effect.Validation concludes that the V_p model is capable of giving a reliable and accurate prediction to the HPM upset susceptibility of a CMOS inverter,which simultaneously considers technology information,ambient temperature,and layout parameters.From the model,the layout parameter L_B has been demonstrated to have a significant impact on the pulse-width upset effect:a CMOS inverter with minor L_b is more susceptible to HPM,which enables us to put forward hardening measures for inverters that are immune from the HPM upset.

英文摘要:

We derive analytical models of the excess carrier density distribution and the HPM (high-power mi- crowave) upset susceptibility with dependence of pulse-width, which are validated by the simulated results and experimental data. Mechanism analysis and model derivation verify that the excess carriers dominate the current amplification process of the latch-up. Our results reveal that the excess carrier density distribution in P-substrate behaves as pulse-width dependence. The HPM upset voltage threshold Vp decreases with the incremental pulse- width, while there is an inflection point which is caused because the excess carrier accumulation in the P-substrate will be suppressed over time. For the first time, the physical essence of the HPM pulse-width upset effect is pro- posed to be the excess carrier accumulation effect. Validation concludes that the lip model is capable of giving a reliable and accurate prediction to the HPM upset susceptibility of a CMOS inverter, which simultaneously consid- ers technology information, ambient temperature, and layout parameters. From the model, the layout parameter LB has been demonstrated to have a significant impact on the pulse-width upset effect: a CMOS inverter with minor LB is more susceptible to HPM, which enables us to put forward hardening measures for inverters that are immune from the HPM upset.

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期刊信息
  • 《半导体学报:英文版》
  • 中国科技核心期刊
  • 主管单位:中国科学院
  • 主办单位:中国电子学会 中国科学院半导体研究所
  • 主编:李树深
  • 地址:北京912信箱
  • 邮编:100083
  • 邮箱:cjs@semi.ac.cn
  • 电话:010-82304277
  • 国际标准刊号:ISSN:1674-4926
  • 国内统一刊号:ISSN:11-5781/TN
  • 邮发代号:2-184
  • 获奖情况:
  • 90年获中科院优秀期刊二等奖,92年获国家科委、中共中央宣传部和国家新闻出版署...,97年国家科委、中共中央中宣传部和国家新出版署三等奖,中国期刊方阵“双效”期刊
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  • 俄罗斯文摘杂志,美国化学文摘(网络版),荷兰文摘与引文数据库,美国工程索引,美国剑桥科学文摘,英国科学文摘数据库,日本日本科学技术振兴机构数据库,中国中国科技核心期刊,中国北大核心期刊(2004版),中国北大核心期刊(2008版),英国英国皇家化学学会文摘,中国北大核心期刊(2000版)
  • 被引量:7754