欢迎您!
东篱公司
退出
申报数据库
申报指南
立项数据库
成果数据库
期刊论文
会议论文
著 作
专 利
项目获奖数据库
位置:
成果数据库
>
期刊
> 期刊详情页
Structure and Properties of Ti-Si-N Coatings Synthesized by Combining Cathode Arc and Middle-frequen
ISSN号:1000-2413
期刊名称:武汉理工大学学报-材料科学版(英文版)
时间:0
页码:702-705
语言:中文
相关项目:离子注入制备多铁性过渡金属化合物CdMeS
作者:
Fu, Dejun|Zhu, Liya|Yang, Zhongtian|Yang, Bing|Guo, Liping|
同期刊论文项目
离子注入制备多铁性过渡金属化合物CdMeS
期刊论文 27
会议论文 3
同项目期刊论文
Effect of ferromagnetic properties in Al-doped Zn1-x Cox O nanowires synthesized by water-assistance
GaN films deposited by middle-frequency magnetron sputtering
Optical, structural, and magnetic properties of p-type InMnP : Zn implanted with the Mn (1 and 10 at
Room temperature ferromagnetism and ferroelectricity behavior of (Cu, Li) co-doped ZnO films deposit
Characterization and properties of TiN-containing amorphous Ti–Si–N nanocomposite coatings prepared
加速器-电镜联机的离子光路及其调整方案
GaN films deposited on glass substrate by middle-frequency magnetron sputtering
Mn注入CdTe晶体的物理性质及其结构研究
Ferromagnetism in self-assembled Ge quantum dots material followed by Mn-implantation and annealing
Magnetic properties of Mn+-implanted and annealed Si1-xGex thin films grown on p-Si(100) substrates
GaN films prepared by middle-frequency magnetron sputtering
Ferromagnetic properties of Mn-implanted Ge/Si quantum dots
Characterization and properties of CrN films deposited by ion-source-enhanced middle frequency magne
Microstructure and mechanical properties of Cr-Si-N nanocomposite coatings deposited by combined cat
Ferroelectricity in Li-implanted ZnO thin films
Effects of Bias Voltage on the Structure and Mechanical Properties of Thick CrN Coatings Deposited b
Synthesis of Ti-Si-N nanocomposite coatings by a novel cathodic arc assisted middle-frequency magnet
Effect of bias voltage on the structure and hardness of Ti-Si-N composite coatings synthesized by ca
中频磁控溅射制备AlN薄膜
Preparation of CrN thick films by high-rate middle-frequency unbalanced magnetron sputtering
Electrodeposition of tubular-rod structure gold nanowires using nanoporous anodic alumina oxide as t
Preparation of GaN films on glass substrates by middle frequency magnetron sputtering
CdMnS的制备及其铁电铁磁性研究
Structural and Raman Analysis of Antimony-Implanted ZnMnO Films
Effects of Bias Voltage on the Structure and Mechanical Properties of Thick CrN Coatings Deposited by Mid-Frequency Magnetron Sputtering
期刊信息
《武汉理工大学学报:材料科学英文版》
中国科技核心期刊
主管单位:
主办单位:武汉理工大学
主编:
地址:武汉市洪山区珞狮路122号
邮编:430070
邮箱:jwutms@mail.whut.edu.cn
电话:027-87384113 87651870
国际标准刊号:ISSN:1000-2413
国内统一刊号:ISSN:42-1680/TB
邮发代号:38-78
获奖情况:
国内外数据库收录:
被引量:149