介绍了一种可调光栅的制作方法。首先通过紫外线光刻的方法,制作出微米尺度的光栅结构(周期8μm),然后将光栅复制在聚甲基硅氧烷(PDMS)薄膜上,形成内嵌式PDMS光栅。利用PDMS优异的弹性,将此薄膜沿着光栅栅线的方向拉伸,随着栅线的伸长,光栅常数也随之变小,周期调节极限为5μm。传统方法制作可调光栅,工艺条件苛刻,制作过程复杂,难以控制,制作成本高,周期较长。提出的制作可调光栅的方法成本低,周期短,工艺过程简单易控制,可广泛应用于微型光谱仪、扫描仪、光通信等领域。
A novel approach for fabrication of a tunable grating is introduced. First, use the method of UV lithography to fabricate a micron-scale grating structure with a period of 8 μm, and transfer the micron-scale grating to PDMS film to obtain the embedded PDMS grating. Taking advantage of excellent elasticity of PDMS, stretch the film along the grating line, as the grating line elongating, grating constant decrease and the period control limit is 5 μm. Traditional method for tunable grating fabrication has harsh process condition, complex fabrication process, high costs and long cycle. This method for adjustable grating fabrication has advantages of low cost, short cycle, simple process and easy to control, so it can be widely used in micro-spectrometer, scanners, optical communications and other fields.